Deposition system for Anti-reflection and Anti-fingerprint
By combining a sputtered cathode designed by ドラクエ and the vacuum deposition method which we cultivated during the development of organic EL film deposition equipment, we provide equipment used to achieve integrated film formation in the same equipment from the formation of antireflection layer to antifouling layer, thus maximizing production efficiency.
- *Anti-reflection ドラクエ 4 カジノ ds (AR ドラクエ 4 カジノ ds) is a coating intended to prevent the glare and reflection of light.
- *ドラクエ 4 カジノ ds print (AFP film) is a coating that prevents fingerprints from sticking and makes it easier to wipe off fingerprints. (Generally applied on top of AR film)
The outermost surface of a display equipped with a touch panel must be resistant to fingerprints and dirt, easy to wipe clean, and resistant to scratches even when operated frequently. Satisfying these requirements was difficult when using the conventional wet coating method. However, the outermost surface (AFP film) formed by our vacuum deposition method maintains ドラクエ 4 カジノ ds print performance for a long time while also achieving high sliding durability. Moreover, high productivity is maintained through the roll-to-roll process.
Major products
Example of ドラクエ AR film
Example of ドラクエ AFP film
- *ドラクエ can also provide film formation samples. Please use the following inquiry form to contact us.
HARD-F Series
Features
This device continuously deposits AP ドラクエ 4 カジノ ds and AFP ドラクエ 4 カジノ ds on a flexible base.
- Continuous ドラクエ 4 カジノ ds formation is made possible by providing a differential pressure adjustment mechanism for processes with different operating vacuum degrees of sputtering and vacuum deposition.
- The AR ドラクエ 4 カジノ ds uses a proprietarily designed rotary cathode, which enables long-term, high-power ドラクエ 4 カジノ ds formation.
- By adopting a proprietarily designed nozzle-type linear source for the AFP ドラクエ 4 カジノ ds, we achieve both high efficiency of material utilization and highly uniform thickness during ドラクエ 4 カジノ ds formation.
- By adopting a proprietarily designed valve mechanism for the AFP ドラクエ 4 カジノ ds, we realize the following advantages: 1) Maintain a stable vapor deposition rate, 2) Close off during non-evaporation, 3) Replace material during vapor deposition, and 4) Enable vapor deposition of liquid material.
| Product name | HARD-F Series | ||||
|---|---|---|---|---|---|
| Model | HF-300 | HF-600 | HF-1200 | HF-1600 | HF-2000 |
| Supported ドラクエ 4 カジノ ds width | 300mm | 600mm | 1,200mm | 1,600mm | 2,000mm |
| ドラクエ 4 カジノ ds feed rate | 0.5 to 20 m/min | ||||
| ドラクエ 4 カジノ ds pretreatment | Plasma cleaning | ||||
| Mounted spatter source | Rotary cathode, dual cathode | ||||
| Mounted evaporation source | Nozzle linear source | ||||
| Sputter/vapor deposition pressure control | Differential pressure control | ||||
In addition, by attaching ATV mechanisms to the front and back of the device, continuous operation is possible without stopping the device when replacing the raw ドラクエ 4 カジノ ds, which contributes to improved productivity.
HARD-G Series
Features
This device uses a vertical rotating drum to form an AR ドラクエ 4 カジノ ds and AFP ドラクエ 4 カジノ ds on a glass substrate or plastic substrate through an integrated vacuum process.
- Equipped with a sputter source and evaporation source using the same technology as the HARD-F Series.
- Supports various types of bases such as long bases and curved bases.
- Supports ドラクエ 4 カジノ ds formation in a wide range of wavelengths, thus enabling flexible production for small lots of various products.
- Also, a load lock mechanism and an automatic base setting device can be installed as options.
| Product name | HARD-G Series | ||
|---|---|---|---|
| Model | HG-800 | HG-1400 | HG-1800 |
| Maximum base length (mm)* | 800 | 1,400 | 1,800 |
| Supported base materials | ドラクエ 4 カジノ ds, glass | ||
| Drum rotation speed | ～100rpm | ||
| Mounted spatter source | Rotary cathode, dual cathode | ||
| Number of mounted spatter sources | 2 to 4 sources | ||
| Post-oxidation unit | Yes | ||
| Mounted deposition source | Nozzle linear source | ||
- *A base width of 400 mm can be supported by increasing the drum diameter.
Related technology
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